CIRP Annals - Manufacturing Technology
www.cirp.net › images › cirpfichiersCIRP Annals - Manufacturing Technology 60 (2011) 371–374 ARTICLE INFO Keywords: Polishing Flatness Semiconductor ABSTRACT Demand for diminishing edge roll off while polishing surfaces such as those of silicon wafers and glass disks has currently exceeded the capabilities of existing technologies. To address this problem, the
CIRP Annals - Journal - Elsevier
https://www.journals.elsevier.com/cirp-annalsCIRP, The International Academy for Production Engineering, was founded in 1951 to promote, by scientific research, the development of all aspects of manufacturing technology covering the optimization, control and management of processes, machines and systems. This biannual ISI cited journal contains approximately 140 refereed technical and ...
CIRP Annals - Journal - Elsevier
www.journals.elsevier.com › cirp-annalsCIRP, The International Academy for Production Engineering, was founded in 1951 to promote, by scientific research, the development of all aspects of manufacturing technology covering the optimization, control and management of processes, machines and systems. This biannual ISI cited journal contains approximately 140 refereed technical and ...